HT.I.B

09:00 - 10:30

Advanced Characterization Techniques
SYNOPSIS
HT.I.B.1 WS.I.A.1	Marco CANTONI EPFL, ENT-R-CIME, Lausanne, Switzerland Focused Ion Beam Nano-Tomography and 3D EDX: What can you expect and where are the limits
HT.I.B.2 WS.I.A.2	Pasqualantonio PINGUE NEST Scuola Normale Superiore, Pisa Lithography and characterization of nanostructures by scanning electron microscopy based techniques abst
Chair: Giulio LAMEDICA, Carl Zeiss Italia In collaboration with: ZEISS
SYNOPSIS Scanning Electron Microcopy it is a well-established surface imaging technique at nanoscale level and, in the recent years, huge development have been done to extend its capabilities to get a complex advanced platform for a complete sample characterization and device fabrication. Recent improvements in EM and in complementary integrated technologies like: FIB (Focused Ion Beam) for 3D nano-tomography and nano machining; EDX (Energy Dispersive Xray) for advanced chemical analisys; pattern generator for lithography and nanodevice fabrication, and manipulation for nano features handling; are offering a wide range of opportunities bringing Scanning Electron Microscopy to the next level. In this session will be illustrated latest experiments in these fields, carried out by major European experts, with outstanding results obtained thanks to the Zeiss technology.