TT.II.A
14:00 - 15:30
| Microscopy methods for Nanotechnology and Nanofabrication | ||
| SYNOPSIS |
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| TT.II.A.1 WS.I.C.1 |
Giulio LAMEDICA Carl Zeiss Italia SpA Extending the Frontiers of Nanotechnology with ion and electron beam solutions Technique and Applications |
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| TT.II.A.2 WS.I.C.2 |
Massimo CUSCUNA' CNR NANOTEC, Lecce Nanostructures for Photonics abst |
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| TT.II.A.3 WS.I.C.3 |
Matthias VAUPEL CV Carl Zeiss Microscopy GmbH, Germany Comparing Confocal and Interference Contrast Microscopy in Topography, Roughness, and Film Thickness Measurement abst |
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| Chair: Luca ORTOLANI, CNR-MM, Bologna In collaboration with: ZEISS |
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SYNOPSIS
Nanotechnology is rapidly extending in really complex and fine structures and Electron and Ion Microscopy are playing a key role in nano patterning and sample modification, with outstanding solutions in machining, deposition and characterization at the nanoscale level. Light microscopy contributes to sample and process understanding and control, providing complementary information. |
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