Direct-write optical lithography: a fast and flexible way to make microstructures

Anthony BEGUIVIN, Durham Magneto Optics, Durham, UK

Conventional approaches to photolithography are usually based on exposing through a chromium-glass mask manufactured by specialist vendors.  In R&D environments it is often necessary to change the mask design frequently.  Direct-write lithography tools (also known as digital mask aligners or maskless aligners) overcome this problem by holding the mask in software.  Rather than projecting light through a physical mask, direct-write lithography uses computer-controlled optics to project the exposure pattern directly onto the photoresist.

The talk will provide technical insight into the MicroWriter ML®3 products as well as a description of the key features.  A few examples of patterned devices with application in condensed matter physics, MEMS and biophysics will be shown.  

 
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